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三门反场效应晶体管与纳米板通道的门偏差稳定性
Hyojoo Heo1, Yunwoo Shin1, Jaemin Son1
1Department of Electrical Engineering, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea.
Nanotechnology
|April 5, 2024
概括
积极偏差应力降低了三门反场效应晶体管 (FBFETs),增加了下值波动. 然而,负偏差应力没有任何影响,回火完全恢复了性能,表明恢复后设备运行稳定.
科学领域:
- 半导体设备物理学 半导体设备物理
- 材料科学是一种材料科学.
背景情况:
- 三门反场效应晶体管 (FBFET) 对于先进的集成电路至关重要.
- 了解门偏差稳定性对于可靠的设备性能至关重要.
研究的目的:
- 为了研究具有 (Si) 纳米板通道的FBFET的门偏差稳定性.
- 分析正偏差应力 (PBS) 和负偏差应力 (NBS) 对晶体管特性的影响.
主要方法:
- 使用Si纳米板道制造FBFET.
- 应用PBS和NBS1000秒,以评估设备的稳定性.
- 分析不同压力条件下的下值波动 (SS) 变化.
- 在300°C的压力后回火以恢复性能.
主要成果:
- 在p和n频道模式中,PBS显著增加了SS (0.3mV dec-1到60和80mV dec-1).
- NBS没有改变SS,表明不对称的应激反应.
- 接口陷很容易获得电子解释了在PBS和NBS下观察到的差异.
- 在300°C10分钟的火中,完全恢复了退化的特性.
结论:
- 由于接口陷动态,FBFET对PBS和NBS表现出不同的反应.
- 这些设备在回火后显示出出色的恢复和恢复稳定性,这表明了强大的运行潜力.
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