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在复合绝缘体表面上追踪污染层中的水分含量,使用超光谱成像技术

Changjie Xia¹, Ming Ren^1,2, Runyu Liu¹

¹School of Electrical Engineering, Xi'an Jiaotong University, Xi'an, Shaanxi 710049, PR China. renming@xjtu.edu.cn.

|April 11, 2024

概括

本研究引入了一种超光谱成像方法,用于评估受污染的电绝缘体中的水分含量,这对于防止电力系统故障至关重要. 该技术准确地可视化了湿和干燥,提高了绝缘体的可靠性.

科学领域:

电气工程电气工程
材料科学材料科学材料科学
遥感遥感遥感遥感

背景情况:

户外电气绝缘器面临由于环境污染造成的故障风险,湿度加剧了这种风险.
评估污染层中的水分含量 (MC) 对于预测绝缘体故障至关重要.

研究的目的:

开发一种有效的方法来评估受污染的绝缘体层中的水分含量.
为了可视化绝缘体上的污染层的动态湿和干燥过程.

主要方法:

使用超光谱成像 (HSI) 技术 (371.08-1037.89 nm) 来捕捉光谱变化.
应用部分最小平方回归 (PLSR) 模型用于数据分析和MC计算.
采用特征频段选择方法来识别关键的光谱特征.

主要成果:

开发了PLSR模型来计算MC像素智能,从而可视化湿/干燥.
通过RE-RF (70%) -PLSR模型 (R2=0.9824,RMSE=0.0367) 实现了高精度.
确定了MC评估的特定特征波段 (543.28 nm和848.01 nm).

结论:

与PLSR相结合的HSI提供了一种强大的技术,用于实时监控受污染的绝缘体的MC.
这种方法有助于分析闪过演变和优化绝缘体设计.
为开发绝缘体的保护性涂层材料提供了见解.

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