线-C

Subhash Neyyattinkara Neelakandan1, Aneesh Sukesan1, Jijo Jerard1

  • 1Biomedical Technology Wing, Sree Chitra Tirunal Institute for Medical Sciences and Technology, Trivandrum, 695012 India.

Transactions of the Indian National Academy of Engineering : an international journal of engineering and technology
|April 16, 2024
PubMed
概括

消毒使用过的面膜对于感染控制至关重要. 使用当地资源开发了一种新的UV-C消毒装置,经过验证,并在印度注册商业化.