根通道牙在最后灌时会磨损,在带有被动超声波灌和易于清洁的仪器的内牙科再处理中,最终灌时会磨损
Louise Schmitt Alves1, Fabiola Ormiga1, Carolina Oliveira de Lima2
1Department of Dental Clinic, Federal University of Rio de Janeiro, Rio de Janeiro, Brazil.
Journal of conservative dentistry and endodontics
|April 18, 2024
概括
被动超声波灌 (PUI) 和易于清洁 (EC) 仪器在内牙科再处理过程中导致牙磨损. 该EC仪器导致了更大的尖端磨损,特别是AH Plus和Total Fill密封器,需要谨慎使用.
科学领域:
- 牙周内科医院 牙周内科医院 牙周内科医院
- 牙科材料科学 牙科材料科学
- 生物材料是一种生物材料.
背景情况:
- 牙内脏再处理的目的是去除填充材料和清洁根管.
- 为了提高再处理效率,采用了补充的清洁程序.
- 牙磨损是机械或超声波清洗方法的潜在问题.
研究的目的:
- 为了评估被动超声波灌 (PUI) 和易于清洁 (EC) 仪器引起的牙磨损.
- 为了比较PUI和EC在最终填充材料的去除过程中产生的磨损,在内牙复制治疗中.
- 用微计算机断层扫描 (micro-CT) 来评估不同的根管三分之一的磨损.
主要方法:
- 微计算机断层扫描 (micro-CT) 用于在灌前后分析道体积.
- 三十六个下面的第一个状状根被分为四组,根据灌 (PUI/EC) 和密封器 (AH Plus/Total Fill).
- 统计分析包括Kruskal-Wallis和配对的Wilcoxon测试来比较体积.
主要成果:
- 无论是PUI还是EC程序,都导致了可观察到的牙磨损,特别是当分析每根道三分之一时.
- 在两种仪器的顶端三分之一中检测到显著的磨损.
- 在使用AH Plus和Total Fill密封器时,EC仪器在顶端三分之一的牙磨损比PUI更大 (P <0.05).
结论:
- 补充的清洁程序,如PUI和EC可以导致牙显著磨损在牙周再处理期间.
- 牙磨损在顶端三分之一更明显,EC显示的磨损比PUI更高.
- 这些补充程序应谨慎使用,以最大限度地减少阳性损伤.
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