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Updated: Jun 20, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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在非平面和不规则的表面上进行电子束光刻.

Chenxu Zhu1, Huseyin Ekinci1, Aixi Pan1

  • 1Department of Electrical and Computer Engineering and Waterloo Institute for Nanotechnology (WIN), University of Waterloo, Waterloo, ON Canada.

Microsystems & nanoengineering
|April 22, 2024
PubMed
概括

电子光束光刻技术使得在不规则的表面上能够精确地制造纳米结构. 喷涂涂层和先进仪器等新技术克服了先前对增强纳米制造的限制.

关键词:
电子束 lithography 电子束 lithography 电子束 lithography 电子束 lithography 电子束 lithography 电子束纳米制造的纳米制造不平面和不规则的表面.血蚀刻等离子体蚀刻

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相关概念视频

Overview of Electron Microscopy01:25

Overview of Electron Microscopy

The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.
Scanning Electron Microscopy01:07

Scanning Electron Microscopy

A scanning electron microscope (SEM) is used to study the surface features of a sample by using an electron beam that scans the sample surface in a two-dimensional manner. Typically, areas between ~1 centimeter to 5 micrometers in width can be imaged. SEM can be used to image bacteria, viruses, tissues as well as larger samples like insects. Conventional SEM gives a magnification ranging from 20X to 30,000X and spatial resolution of 50 to 100 nanometers.
Fundamental Principles
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