一种原子解析的肖特基屏障高度方法,以弥合金属半导体异质连接的理论和实验之间的差距
Viacheslav Sorkin1, Hangbo Zhou1, Zhi Gen Yu1
1Agency for Science, Technology and Research (A*STAR), Institute of High Performance Computing (IHPC), 1 Fusionopolis Way, #16-16 Connexis, Singapore 138632, Republic of Singapore.
ACS applied materials & interfaces
|April 22, 2024
概括
我们开发了一种新方法,用于精确测量金属半导体接口上的Schottky屏障高度 (SBH) 变化. 这种方法解释了MoS2@Au异质连接的差异,揭示了缺陷引起的欧米接触.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 表面科学是一门学科.
背景情况:
- 肖特基屏障高度 (SBH) 对金属半导体接触性能至关重要.
- 现有的方法很难解释MoS2@金属异质连接中的实验性SBH变化.
- 理论预测和实验SBH测量之间仍然存在差异.
研究的目的:
- 提出一个原子解析的方法来计算空间SBH变化.
- 为了使有效的SBH值与导电性测量相关的计算.
- 为了研究MoS2@Au异质连接与粒边界的SBH变化.
主要方法:
- 原子特异性部分密度状态 (PDOS) 的计算.
- 适用于具有导电和半导体颗粒边界的MoS2@Au异质连接.
- 在原子尺度上分析SBH变化的分析.
主要成果:
- 在有缺陷的异质连接中,在原子水平上观察到显著的SBH变化.
- 在缺陷扩展的区域,SBH接近零,表明欧米接触.
- 有效的SBH本质上取决于缺陷密度和特征.
结论:
- 提出的方法成功地解释了MoS2@金属系统中的实验SBH变化和差异.
- 在计算和实验有效SBH值之间表现出良好的一致性.
- 提供了理解和操纵金属半导体异质连接中的SBH的途径.
关键词:
GBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBsGBs在原子分辨率上SBH.边缘的移位,边缘的移位.有效的SBH是有效的.在SBH的空间变化.更多相关视频
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