在石墨烯场效应晶体管中,制造过程对接触电阻和通道的影响
Babak Khosravi Rad1, Amir Hossein Mehrfar2, Zahra Sadeghi Neisiani2
1Optoelectronics and Nanophotonics Research Group, Faculty of Electrical and Computer Engineering, Tarbiat Modares University, Tehran, Iran.
Scientific reports
|April 22, 2024
概括
优化制造工艺可以显著降低石墨烯晶体管的接触电阻. 和改变的光刻法步骤改善了石墨烯的附着性,并将残留物降到最低,从而提高了设备的性能.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 纳米技术 纳米技术
背景情况:
- 接触电阻是限制基于石墨烯的晶体管性能的一个关键因素.
- 制造工艺严重影响金属-石墨烯接触质量.
研究的目的:
- 研究制造工艺对接触电阻的影响.
- 优化制造步骤以提高石墨烯晶体管性能.
主要方法:
- 使用转移长度方法 (TLM) 来测量接触电阻.
- 采用化学蒸汽沉积 (CVD) 培养的石墨烯的回火和修改的光刻法序列.
主要成果:
- 化改善了石墨烯的粘附性,并减少了PMMA残留物.
- 在光刻法之前,一个涉及金属沉积的制造序列将光电阻残留最小化,降低了接触阻力.
- 对于尼-石墨烯接触器,达到470 Ω·μm的接触电阻.
结论:
- 制造过程的顺序极大地影响了石墨烯晶体管的特性,如接触电阻,通道电阻和导电性.
- 优化的制造,包括和调整的光刻法,导致石墨烯晶体管性能得到改善.
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