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Updated: Jun 28, 2025

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通过最佳电子陷和染料敏感化之间的协同作用来增强持久发光

Zi-Jin Wei1, Chang Yin1, Mengjie Sun1

  • 1Key Laboratory of Functional Polymer Materials of Ministry of Education, Institute of Polymer Chemistry, College of Chemistry, Nankai University, Tianjin 300071, China.

ACS applied materials & interfaces
|April 24, 2024
PubMed
概括

研究人员增强了持久发光纳米粒子 (PLNPs) 以获得更好的成像. 用Dil对染料的敏感性显著提高了氧化氧化 (ZGC) PLNPs的后发光信号和持续时间,改善了瘤成像和手术指导.

关键词:
染料敏感化的染料电子陷是一种电子陷.转移能量转移能量是什么?持续发光的纳米粒子.瘤成像图像检查可以

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