一个新型不对称的沟SiC金属氧化物半导体场效应晶体管与多Si/SiC异质连接二极管,以优化反导性能
Yiren Yu1, Zijun Cheng1, Yi Hu1
1School of Microelectronics and Communication Engineering, Chongqing University, Chongqing 400030, China.
Micromachines
|April 27, 2024
概括
一个新的碳化MOSFET设计与一个Poly-Si/SiC异质连接二极管 (HJD-ATMOS) 显著改善反向导和开关性能. 这种创新的结构降低了切断电压和开关损失,同时保持了故障电压.
科学领域:
- 半导体设备物理学 半导体设备物理
- 动力电子产品的动力电子.
- 材料科学 是一种材料科学.
背景情况:
- 碳化 (SiC) MOSFET由于其优越的性能,对高功率应用至关重要.
- 传统的非对称沟SiC MOSFET (C-ATMOS) 在反向导和切换效率方面面临挑战.
- 在不影响静态性能的情况下改进体二极管特性是一个关键的研究领域.
研究的目的:
- 设计和评估一个新的不对称沟SiC MOSFET,其中包含一个Poly-Si/SiC异质连接二极管 (HJD-ATMOS).
- 与传统设计相比,提高反导特性和切换性能.
- 为了减少切断电压和开关损失,同时保持高故障电压.
主要方法:
- 设计了一种新的HJD-ATMOS结构,其中包括一个集成的异质连接二极管和一个分割门.
- 使用 TCAD (技术计算机辅助设计) 模拟来进行设备分析.
- 将HJD-ATMOS与C-ATMOS的性能指标 (切断电压,门到排水电荷,开关损失) 进行比较.
主要成果:
- 与C-ATMOS相比,HJD-ATMOS显示了切入电压 (V_cut-in) 的53.04%的降低.
- 门到排水负荷 (Q_gd) 降低了31.91%.
- 在拟议的HJD-ATMOS结构中,切换损失减少了40.29%.
结论:
- 集成的Poly-Si/SiC异质连接二极管有效地提高了车身二极管的特性和自动转动能力.
- 与C-ATMOS相比,HJD-ATMOS设计提供了卓越的反向导和切换性能.
- 这种新的设备结构为功率电子应用提供了有前途的进步.
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