降低Schottky屏障高度通过高性能p型MoTe2场效应晶体管的准范德瓦尔斯接触
Ze Yang1, Xingkun Peng1, Jinyong Wang2
1Department of Microelectronics and Integrated Circuit, School of Electronic Science and Engineering (National Model Microelectronics College), Xiamen University, Xiamen 361005, China.
ACS applied materials & interfaces
|April 27, 2024
概括
我们使用一种新的范德瓦尔斯传输过程开发了高性能p型二甲 (MoTe2) 晶体管. 这种方法显著降低了2D电子产品的接触电阻.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 二维 (2D) 过渡金属二甲基化物 (TMD) 显示出对下一代电子产品的前景.
- 金属TMD接口的高接触电阻,特别是p型TMD,阻碍了设备的性能.
研究的目的:
- 为了应对p型TMD中高接触电阻的挑战.
- 为了展示具有较低接触电阻的高性能p型MoTe2场效应晶体管 (FET).
主要方法:
- 使用非破坏性范德瓦尔斯 (vdW) 传输过程.
- 集成二甲化物 (PtTe2) 作为MoTe2 FET的半金属接触物.
- 使用传输电子显微镜 (TEM) 描述了接口属性.
主要成果:
- 在带有 PtTe2 接触的 MoTe2 FET 中取得显著改善的电气特性.
- 观察到移动性增加到80cm^2V^-1s^-1和当前状态上升到5.0μA/μm.
- 降低了Schottky屏障高度 (SBH) 到48 meV,表明有效的载体注入.
结论:
- 在MoTe2 FET中,PtTe2半金属接触通过准-vdW接口实现了低接触电阻.
- 接口工程策略为创建低电阻VDW接触提供了一个简单的方法.
- 这种方法为2D材料在先进的光电子和电子领域提供了机会.
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