直接结合化与接口的热边界导电性
Tarmo Nieminen1, Tomi Koskinen2, Vladimir Kornienko2
1Department of Electrical Engineering and Automation, Aalto University, Espoo 02150, Finland.
概括
与在绝缘体 (SOI) 晶圆集成的化 (AlN) 为微电子提供了更好的散热. 这种AlN-SOI结构通过提高导热率和有效管理热量,优于传统的SOI.
科学领域:
- 材料科学 材料科学 材料科学
- 微电子工程 微电子工程
- 热管理 热管理
背景情况:
- 热量的积累和自我加热是小型化和3D微电子设备的关键挑战.
- 在在绝缘体 (SOI) 结构中的传统二氧化 (SiO2) 绝缘体限制了由于低导热率的散热.
- 探索替代绝缘材料对于提高微电子中的热性能至关重要.
研究的目的:
- 为了研究直接结合化 (AlN) -SOI晶圆 (AlN-SOI) 结构的热特性.
- 在Si/AlN和Si/SiO2/AlON/AlN接口上测量AlN的导热率和热边电导率 (TBC).
- 评估AlN-SOI在微电子应用中改善散热的潜力.
主要方法:
- 直接将AlN与SOI晶片结合在一起.
- 测量AlN的导热能力.
- 使用等离子体激活结合技术在关键接口的热边界导电性 (TBC) 的表征.
主要成果:
- 测量AlN的导热率大约为40 W m-1 K-1.1.
- 在Si/AlN和Si/SiO2/AlON/AlN接口的热边界导电量 (TBC) 发现约为100 MW m−2 K−1.1.
- 与传统的SOI晶圆相比,AlN-SOI结构显示出优越的热性能.
结论:
- 与传统的SOI相比,AlN-SOI显著提高了热性能.
- 测量到的热性能表明,AlN-SOI是先进散热解决方案的非常有前途的材料.
- 这项研究为下一代微电子设备的更有效的热管理铺平了道路.
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