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在单门和双门装置结构的GNR-FET中,gm/ID和fT之间的权衡分析
Md Akram Ahmad1, Pankaj Kumar2, Bhubon Chandra Mech3
1Department of Electronics Engineering, Indian Institutes of Technology, Dhanbad, 826004, India. akram14407@gmail.com.
Scientific reports
|May 3, 2024
概括
双门石墨烯纳米带场效应晶体管 (GNRFET) 显示出比单门设计更好的模拟/射频性能. 这两种GNRFET类型都实现了千兆赫的切割频率,为射频应用提供了宝贵的见解.
科学领域:
- • 凝聚物质物理学和材料科学.
- • 先进的半导体设备物理和工程.
背景情况:
- • 场效应晶体管 (FET) 对于模拟/射频应用至关重要.
- • 石墨烯纳米带 (GNR) 为下一代晶体管提供独特的电子特性.
- • 了解GNRFET的操作参数是设备优化的关键.
研究的目的:
- • 分析和比较单门 (SG) 和双门 (DG) GNRFET 的模拟/射频操作参数.
- • 评估模拟/射频性能的优点数据 (FoM),包括增益,频率和效率.
- • 调查GNRFET特征对混合静态随机存取内存 (SRAM) 电路的影响.
主要方法:
- • 原子 pz 轨道模型来自石墨烯纳米丝带哈密尔顿.
- • 非平衡格林函数 (NEGF) 形式主义用于设备分析.
- •紧密结合的哈密尔顿式与原子的pz轨道基础设置为通道特征.
主要成果:
- •GD GNRFETs与SG GNRFETs相比,显示出优越的模拟/射频性能.
- • 总干事和GD GNRFET都实现了千兆赫的切割频率.
- • 分析提供了对模拟/射频性能和SRAM电路影响的综合性价值数据 (FoM).
结论:
- • DG GNRFETs为增强模拟/射频电路设计提供了一个有希望的途径.
- • 该研究提供了对模拟应用的权衡的详细见解.
- • GNRFETs显示出对高性能SRAM应用的潜力.
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