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在聚焦电子束诱导的处理中侧墙角调整.

Sangeetha Hari^1,2, Willem F van Dorp^1,3, Johannes J L Mulders⁴

¹Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628CJ Delft, Netherlands.

Beilstein journal of nanotechnology

|May 7, 2024

概括

此摘要是机器生成的。

聚焦电子束诱导沉积 (FEBID) 结构现在具有使用新的FEBID和蚀刻技术的垂直侧墙. 这种方法可以精确控制侧墙角,克服传统FEBID制造的局限性.

关键词:

一个叫做FEBID的女生.菲比 (Febie) 是一个发病症.在FEBIPIP上,我们可以看到.电子石版印刷电子石版印刷侧面墙壁的角度侧面墙的角度

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科学领域:

材料科学材料科学材料科学
纳米技术纳米技术
表面科学是一门学科.

背景情况:

聚焦电子束诱导沉积 (FEBID) 通常会导致侧墙倾斜的结构.
倾斜的侧墙对于需要精确的3D纳米架构的应用而言是有问题的,特别是在相互连接的系统中.

研究的目的:

开发和演示一种用于制造具有垂直侧墙的FEBID结构的新技术.
通过FEBID和聚焦电子束诱导蚀刻 (FEBIE) 方法来研究侧墙角度的控制.

主要方法:

使用一种双重方法,将FEBID用于沉积和FEBIE用于蚀刻.
使用水作为碳基FEBID结构的蚀刻剂.
使用传输电子显微镜 (TEM) 和现场扫描电子显微镜 (SEM) 分析蚀刻结构.

主要成果:

通过控制电子束的蚀刻位置,实现可调节的侧墙角度,从外向到内向,通过控制电子束的蚀刻位置.
观察到意外的下蚀刻,归因于沉积物和基板的二次电子排放.
开发了一种分析模型来解释观察到的地下蚀刻现象.

结论:

结合FEBID和FEBIE技术,可以精确控制纳米结构中的侧壁几何.
二次电子排放在蚀刻过程中起着至关重要的作用,导致复杂的侧墙形状.
这种方法可以制造出高级应用所必需的高比例纳米结构.