关于对SnAgCu和SnZn接接头的杂质影响的比较研究,带有电子沉积的Cu
Yu-Ju Li1, Yee-Wen Yen2,3, Chih-Ming Chen1
1Department of Chemical Engineering, National Chung Hsing University, 145 Xingda Rd., South Dist., Taichung 402202, Taiwan.
Materials (Basel, Switzerland)
|May 11, 2024
概括
铜电层中的杂质严重损坏了Sn-3Ag-0.5Cu (SAC305) 接接头,导致空隙和更快的金属间化合物生长. 基于Sn-9Zn的合剂对这些杂质的影响最小.
科学领域:
- 材料科学 材料科学 材料科学
- 金工业是金工业的一个方面.
- 表面工程是什么?表面工程是什么?
背景情况:
- 无合金如Sn-3Ag-0.5Cu (SAC305) 和基于Sn-9Zn的合金对于电子包装至关重要.
- 通过电金属化铜是常见的,但添加剂可以引入杂质.
- 这些杂质可能会损害接接头的完整性.
研究的目的:
- 调查电铜中的杂质对无接头可靠性的影响.
- 为了比较杂质对SAC305和Sn-9Zn合金的影响.
- 了解不同杂质水平下的界面反应和金属间化合物 (IMC) 形成.
主要方法:
- 使用功能添加剂制造高和低杂质铜电层.
- 将SAC305和基于Sn-9Zn的合金连接到准备好的铜层中.
- 接接头在120°C和170°C时的热老化.
- 界面反应和IMC生长的微结构分析.
主要成果:
- 铜中的高杂质含量显著降解了SAC305/Cu接口,导致大规模的空隙形成和 Cu6Sn5 IMC 增长的加速.
- 基于Sn-9Zn的接接头表现出Cu5Zn8 IMC增长,这在很大程度上不受铜杂质水平的影响.
- 基于Sn-9Zn的接接头中没有空隙,无论杂质含量如何,都表明了强大的接口.
结论:
- 杂质对接接头可靠性的影响在SAC305和基于Sn-9Zn的合金之间有很大差异.
- IMC形成和原子扩散机制的差异解释了对杂质的不同易感性.
- 与SAC305.5相比,基于Sn-9Zn的合剂在电铜中的杂质方面具有更高的可靠性.
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