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相关概念视频

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

208
Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used....
208

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相关实验视频

Updated: Jun 24, 2025

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基于垂直定向合的光学相位阵列格排放工程.

Jiazhu Duan, Weiming Yao, Xiangjie Zhao

    Optics letters
    |June 2, 2024
    PubMed
    概括

    一个新的垂直定向合波导网格 (VDCWG) 允许更长的芯片上光学相位阵列天线. 这一创新提高了网格强度,为更大的光圈光学相位阵列铺平了道路.

    科学领域:

    • 光子学 是一个光子学.
    • 集成光学 集成光学 集成光学
    • 天线工程天线工程

    背景情况:

    • 在芯片上的光学相位阵列 (OPA) 需要长波导电网格天线,用于大光圈.
    • 现有的架构在天线长度和格子强度控制方面面临限制.

    研究的目的:

    • 提出和演示一种新的垂直定向合波导网格 (VDCWG) 架构.
    • 为了增强天线长度,并提供精确的控制格子发射强度的大孔OPAs.

    主要方法:

    • 对VDCWG的理论分析和数值模拟.
    • 一个VDCWG天线和一个16通道OPA的实验演示.

    主要成果:

    • VDCWG架构允许在两个数量级上调整格子强度.
    • 有效的格子长度超过1厘米是可以实现的.
    • 一个1.5毫米的VDCWG天线显示了0.17毫米-1的格子强度和0.061°的分歧角度.

    结论:

    • 该VDCWG为工程格排放强度提供了显著的设计自由.
    • VDCWG架构显示了实现大孔芯片上光学相位阵列的强大潜力.

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