概括
倾斜的侧墙可以提高深紫外线 (DUV) LED 的光提取效率 (LEE). 最佳角度因芯片大小而异,较小的LED从直接散射中受益更多,较大的LED从散射前的内部反射中受益更多.
科学领域:
- 材料科学 材料科学 材料科学
- 光电学是指光电子产品.
- 半导体设备 半导体设备
背景情况:
- 光提取效率 (LEE) 对基于AlGaN的深紫外线 (DUV) 发光二极管 (LED) 至关重要.
- 已知倾斜的梅萨侧墙可以增强LEE,但最佳角度各不相同.
- 了解倾斜侧墙的DUVLED中LEE增强的起源是必不可少的.
研究的目的:
- 为了研究侧墙倾斜角度对基于AlGaN的DUVLED中LEE的影响.
- 通过分析不同的面板直径来探索LEE增强的起源.
- 为了确定不同DUV LED芯片大小的最佳倾斜侧墙角度.
主要方法:
- 使用射线跟踪模拟来分析DUV LED中的光传播.
- 这项研究研究了不同倾斜的侧墙角度和面板直径的影响.
- 考虑了分散机制和材料吸收效应.
主要成果:
- 倾斜的侧墙增强了小型和大型DUVLED中的LEE.
- 小尺寸的DUV LED显示出更大的LEE增强,这是由于散射长度和吸收减少.
- 最佳倾斜的侧墙角度在25°-65°之间,并且随着芯片大小的增加而减少.
结论:
- 最佳倾斜的侧墙角度取决于DUV LED芯片大小.
- 更小的芯片从直接光线散射到逃生中受益.
- 较大的芯片使用总内部反射,然后散射以增强LEE.
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