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在三种不同的pH条件下对正义牙支架的金属离子释放的定量和定性分析 - - 一项邀请研究
Pradeep DA1, Saraa Angel L1, Prabhat Kumar Chaudhari1
1Division of Orthodontics and Dentofacial Deformities, Centre for Dental Education and Research, All India Institute of Medical Sciences, New Delhi, 110029, India.
化口水可以腐蚀不钢正牙支架,特别是在酸性条件下. 性pH也会导致的释放,随着时间的推移影响支架的完整性.
科学领域:
- 牙科材料科学 牙科材料科学
- 生物材料工程 生物材料工程
- 腐蚀科学 腐蚀科学
背景情况:
- 化口腔冲洗产品可以创造一种抗的口腔环境.
- 然而,它们可以降低口腔pH值,可能会损害正牙支架表面.
- 长时间使用可能会导致支架地形的腐蚀性变化.
研究的目的:
- 量化和定性地评估表面地形变化.
- 为了评估不钢 (SS) 支架释放的金属离子.
- 在不同的酸性和性pH水平下研究这些效应.
主要方法:
- 40个SS支架被浸泡在人工唾液和化口水溶液中48小时,pH值为5.5,6.7,7和8.
- 使用扫描电子显微镜 (SEM) 分析了表面形态.
- 使用能量分散X射线光谱分析 (EDAX) 来量化离子释放.
主要成果:
- 酸性pH (5.5) 引起了显著的表面变化 (平均得分为3.4).
- 在性 (pH8) 和中性 (pH7) 溶液中,的释放量显著增加.
- 与中性和性条件相比,在酸性溶液中检测到过多的碳.
结论:
- SEM和EDAX分析显示,化物离子对SS支架的腐蚀作用.
- 酸性pH诱导最大的表面变化.
- 性pH促进了显著的释放.
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