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基于GaN的低功率JLDG-MOSFET:兴奋剂和门工作功能的影响
Nayeema Hasan1, Md Rafiqul Islam1, Md Tanvir Hasan2
1Department of Electrical and Electronic Engineering, Khulna University of Engineering and Technology (KUET), Khulna, 9203, Bangladesh.
Heliyon
|June 6, 2024
概括
这项研究探讨了化 (GaN) 无连接双门 (JLDG) MOSFET,以提高性能. 优化的兴奋剂和门工作功能显著提高了下一代电子产品的启动电流,并减少了关闭状态电流.
科学领域:
- 半导体设备物理 半导体设备物理
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
背景情况:
- 传统的MOSFET在缩放尺寸方面面临着局限性.
- 化 (GaN) 为先进的设备提供了卓越的电子性能.
- 没有交叉点的双门结构 (JLDG) 提供了一条克服扩展挑战的途径.
研究的目的:
- 为了研究基于GaN的JLDG MOSFET的性能.
- 为了优化设备参数,如兴奋剂概况 (ND) 和门工作功能 (Ф).
- 为了评估尺度设备的优点数字 (FOMs).
主要方法:
- 使用Silvaco Atlas 2D模拟器进行设备建模.
- 对短通道JLDG MOSFET的分析模型进行验证.
- 系统调整兴奋剂度和门工作功能.
主要成果:
- 达到0.9 mA/μm的最大ON电流 (ION) 在ND = 1 × 1019 cm-3的情况下实现.
- 最低的OFF状态电流 (IOFF) 为1.24 × 10-16 A/μm,功耗为9.69 × 10-17 W/μm,在F=5.1 eV (Au) 的情况下.
- 异常开关电流比率 (ION/IOFF) 为 7.56 × 10 12 .
结论:
- GaN JLDG MOSFET在关键性能指标上显示出显著的改进.
- 优化的兴奋剂和门工作功能对于设备增强至关重要.
- 这些设备对下一代电子产品中低功耗逻辑切换应用非常有希望.
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