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在现场使用光合NMR光谱评估mAb配方的光稳定性

Jack E Bramham1, Yujing Wang2, Stephanie A Moore2

  • 1Department of Chemistry, School of Natural Sciences, Faculty of Science and Engineering, The University of Manchester, Manchester M1 7DN, U.K.

Analytical chemistry
|June 7, 2024
PubMed
概括

暴露于光线会导致单克隆抗体 (mAbs) 的降解. 这项研究揭示了UV-A照明期间的短暂基因形成,暴露后持续存在,影响mAb稳定性.

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