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Updated: Jun 24, 2025

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使用交替校准定位和系统错误的拼接干扰计

Yi Zong, Caiyun Yu, Weijian Liu

|June 11, 2024

概括

这项研究引入了一种新的拼接干扰测量方法 (SIAC),通过对定位和系统错误的交替校准来准确测量大型光学表面. SIAC提高了光学表面测量的精度.

科学领域:

光学工程是指光学工程.
计量学计量学计量学
表面计量学表面计量学

背景情况:

拼接干扰测量对于大光表面的高精度,非接触测量至关重要.
低光圈定位和系统错误显著降低了全光圈表面重建的准确性.

研究的目的:

开发一种新的接干扰测量方法,以准确地解和校准定位和系统错误.
为了提高在接干扰测试中全孔径表面重建的精度.

主要方法:

引入了带有交替校准 (SIAC) 的拼接干扰计,以分离定位和系统错误.
开发了一种代加权阶段拼接模型,用于定位错误校准的垂直投射.
采用单次亚开口旋转测量和用于参考误差校正的全局适配.

主要成果:

数字模拟证实了SIAC在校准定位和系统错误方面的有效性.
在平面镜和海翅形球上进行的实验测量验证了该方法的准确性和实用性.
实现了准确的合全孔隙相位分布和正面交叉测试结果.

结论:

SIAC有效校准定位和系统错误,从而实现精确的相位拼接.
开发的方法显著提高了用于光学表面测量的接干扰的精度和实用性.

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