原子进化机制和抑制在化物中边缘线程失位的机制 远程异质位

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Updated: Jun 24, 2025

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Bo Shi1,2, Zhetong Liu3, Yang Li1,2

  • 1Research and Development Center for Solid State Lighting, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.

Nano letters
|June 11, 2024
PubMed
概括

减少化物涂层器的边缘线程位移 (TD) 对设备性能至关重要. 用石墨烯辅助的远程异质显著降低了边缘TD密度,通过启用新的应变放松通路.

关键词:
边缘线程变位 位移 边缘线程变位石墨烯是一种石墨烯.化物薄膜是一种化物薄膜.远程的异质性皮质化 (heteroepitaxy) 是一个很大的问题.自发的应力放松放松.

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