真空门介电无兴奋剂碳纳米丝带/纳米管场效应晶体管用于抗辐射纳米电子的性能投影
Khalil Tamersit1,2,3, Abdellah Kouzou4,5,6, José Rodriguez7
1National School of Nanoscience and Nanotechnology, Abdelhafid Ihaddaden Science and Technology Hub, Sidi Abdellah, Algiers 16000, Algeria.
Nanomaterials (Basel, Switzerland)
|June 13, 2024
概括
本研究探讨了真空门介电性无兴奋剂碳纳米管/纳米带场效应晶体管 (VGD-DL CNT/GNRFET). 这些设备显示了对辐射硬化,高性能纳米电子和改进的切换能力的承诺.
科学领域:
- 半导体物理 半导体物理
- 纳米电子学纳米电子学
- 材料科学 材料科学 材料科学
背景情况:
- 传统的场效应晶体管面临着辐射和制造复杂性的挑战.
- 真空门介电体 (VGD) 通过防止被困电荷,提供辐射硬度.
- 无兴奋剂设计简化了纳米尺度的制造.
研究的目的:
- 通过计算分析VGD无兴奋剂CNT/GNRFET的性能.
- 在 MOSFET 和道 FET (TFET) 模式下调查设备特性.
- 探索超级尺度设备的外部增强策略.
主要方法:
- 量子模拟方法使用波桑解法器和非平衡格林函数 (NEGF).
- 考虑了弹道运输的极限.
- 通过源头和排水门实现静电兴奋剂.
主要成果:
- 证明真空纳米设备的稳定性,用于高性能,耐辐射切换.
- 对潜在分布,转移特征和关键绩效指标的全面分析.
- 通过调整剂门电压成功提出了通过调整剂门电压来进行外在增强的建议.
结论:
- 无VGD兴奋剂的CNT/GNRFET适用于高性能,耐辐射的应用.
- 外在的兴奋剂门调整可以优化带图和切换性能.
- 这些基于碳的纳米晶体管具有超大规模,高能效和抗辐射纳米电子的潜力.
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