堆叠故障使中心对称范德瓦尔斯RhI中第二次波生成成为可能3
1School of Materials Science and Engineering, Harbin Institute of Technology, Harbin 150001, China.
ACS nano
|June 13, 2024
概括
像RhI3这样的范德瓦尔斯 (vdW) 材料中的堆叠故障可以创建可调节的第二波生成 (SHG). 施加压力通过修改电子过渡和层间相互作用来增强SHG.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 光电学是指光电子产品.
背景情况:
- 范德瓦尔斯 (vdW) 材料为非线性光学应用提供了潜力.
- 在VDW材料中的堆叠故障可以改变晶体对称性和第二波生成 (SHG).
- 在VDW材料中堆叠故障控制的SHG的起源和可调性尚未得到充分理解.
研究的目的:
- 从理论上揭示了VDW材料中堆叠故障控制的SHG的起源.
- 通过结构修改和外部刺激来研究SHG的可调性.
- 为设计用于非线性纳米光学的VDW材料奠定基础.
主要方法:
- 理论计算以确定SHG在堆叠故障中的来源.
- 实验性结构特征和SHG测量.
- 应用水静压来研究结构演变及其对SHG的影响.
主要成果:
- 确定了RhI3中的AC̅堆叠故障作为SHG的来源,主要是沿 Γ-M 和 Γ-K 路径的电子过渡.
- 通过实验证实了堆叠故障控制的SHG.
- 由于压缩诱导的电子过渡和层间相互作用的变化,在水静压下观察到高达6.9倍的SHG增强.
结论:
- 在VDW材料中的堆叠故障为控制SHG提供了一种机制.
- 液压压力可以通过改变其电子和结构性质,显著调整RhI3中的SHG响应.
- 堆叠断层的战略设计为先进的非线性纳米光学提供了一个有希望的路线.
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