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金属薄膜原子层沉积的表面化学

Francisco Zaera1

  • 1Department of Chemistry, University of California, Riverside, CA 92521, United States of America.

Nanotechnology
|June 18, 2024
PubMed
概括

了解金属薄膜原子层沉积 (ALD) 的表面化学是优化当前过程和设计新过程的关键. 这种知识有助于控制片的特性,并推进ALD技术.

关键词:
原子层沉积 (ALD) 是指原子层的沉积.红外吸收光谱法 (IR) 红外吸收光谱法金属有机前体金属有机前体再氧化化学还原化学表面科学 表面科学温度编程绝吸法 (TPD) 是指温度编程绝吸法.在X射线光电子光谱学 (XPS) 中.

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