在垂直道FET中使用低功能的活金属条和排水处的低k材料减少了下值摆动
Kalai Selvi Kanagarajan1, Dhanalakshmi Krishnan Sadhasivan2
1Department of Electronics and Communication Engineering, Government College of Engineering, Tirunelveli, Tamil Nadu, India.
Beilstein journal of nanotechnology
|June 26, 2024
概括
研究人员设计了一种新的垂直道场效应晶体管 (TFET),使用活金属条和低k介电. 这种设计显著减少了泄漏电流,并改善了先进电子产品的关键性能指标.
科学领域:
- 半导体设备物理学 半导体设备物理
- 材料科学用于电子产品.
背景情况:
- 道场效应晶体管 (TFET) 由于其的切换特性,提供了低功耗运行的潜力.
- 改进TFET中的子值波动和开/关电流比对于下一代集成电路至关重要.
研究的目的:
- 设计和分析一种新的垂直TFET结构,其中包括活金属条和低k介电.
- 调查这些材料对关键设备性能参数的影响.
主要方法:
- 设计了一个垂直TFET结构,在通道排水中使用低kSiO2,在源通道附近的高kHfO2层中使用活金属条.
- 使用参数评估设备性能,包括离位电流 (Ioff),下值摆动,值电压和开/关电流比率 (Ion/Ioff).
主要成果:
- 集成的活金属条和低k介电器实现了极好的5mV/十年的下值摆动.
- 泄漏电流被显著降低到1.4 × 10^-17 A/μm.
- 取得了令人印象深刻的7.14 × 10 ^ 11的开/关电流比和0.28V的门电压.
结论:
- 拟议的TFET设计采用活金属条和低k介电体,表现出卓越的性能,特别是在泄漏电流降低和下值摆动方面.
- 这种创新的结构对开发高效和低功耗的半导体设备具有前景.
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