LiNbO3

Haiqing Jiang1, Cuihua Dai1, Bowen Shen1

  • 1School of Microelectronics, Fudan University, Shanghai 200433, China.

概括

研究人员通过添加中间层来改进酸 (LiNbO3) 域壁随机访问存储器 (DWRAM). 这大大提高了先进的集成电路的电流密度和设备速度.

相关概念视频

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Metal-Semiconductor Junctions

The contact of metal and semiconductor can lead to the formation of a junction with either Schottky or Ohmic behavior.
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MOS Capacitor01:25

MOS Capacitor

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MOSFET: Enhancement Mode01:22

MOSFET: Enhancement Mode

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Schottky Barrier Diode01:27

Schottky Barrier Diode

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