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Hao-Yu Chen1, Hung-Chang Hsu2, Jhih-Yuan Liang2
1Graduate School of Advanced Technology, National Taiwan University, Taipei 10617, Taiwan.
研究人员设计了过渡金属二甲基化物 (TMD) 的原子尺度缺陷,以了解电子缺陷相互作用. 这种缺陷工程改善了下一代电子技术的载体运输.
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