一个新的4H-SiC不对称的MOSFET,具有步沟
Zhong Lan1, Yangjie Ou1, Xiarong Hu2
1School of Electrical Engineering, Southwest Jiaotong University, Chengdu 611756, China.
Micromachines
|June 27, 2024
概括
一种新型的碳化不对称的MOSFET带有步沟 (AST-MOS) 提高了设备的性能. 这种设计提高了故障电压,降低了电阻,在动力电子产品中提供了竞争优势.
科学领域:
- 材料科学 材料科学 材料科学
- 电气工程 电气工程
- 半导体物理 半导体物理
背景情况:
- 碳化 (SiC) 电源设备对于高效电子产品至关重要.
- 现有的沟MOSFET结构在故障电压和电阻方面存在局限性.
研究的目的:
- 提出和研究一种具有阶梯沟 (AST-MOS) 的新型碳化不对称MOSFET.
- 提高通道密度,并引入一个新的电压耐受区域.
- 为了降低门电容比率以提高性能.
主要方法:
- AST-MOS结构的制造和表征.
- 使用双槽MOSFET (DT-MOS) 和深层双槽MOSFET (DDT-MOS) 的比较分析.
- 研究JFET区域电阻与氧化物电场之间的权衡.
主要成果:
- AST-MOS显示了故障电压的显著增加 (分别比DT-MOS和DDT-MOS高200V和50V).
- 与DT-MOS和DDT-MOS相比,实现了特定电阻的21.8%和10%的下降.
- 降低了诱导交叉通话电压和开关损失.
- 确定了阶梯沟和深沟设计的最佳权衡.
结论:
- AST-MOS表现出卓越的性能指标,包括更高的故障电压和更低的电阻.
- 阶梯沟设计为先进的SiC电源设备应用提供了竞争优势.
- 这种新的结构为下一代动力电子产品提供了一个有前途的途径.
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