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Updated: Jun 22, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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UO0/±和UF0/±的能量和电子特性

João G F Romeu1, Ashley R E Hunt2, Gabriel F de Melo1

  • 1Department of Chemistry and Biochemistry, The University of Alabama, Tuscaloosa, Alabama 35487-0336, United States.

The journal of physical chemistry. A
|July 2, 2024
PubMed
概括

高级计算显示,氧化 (UO) 和化 (UF) 呈现强烈的离子键. O显示了比UF更高的键解离能,表明了更大的稳定性.

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