在 (001) 导向的膜的喷射表层生长过程中形成 {111} 导向域
Jürgen Weippert1, Lutz Kirste1, Patrik Straňák1
1Fraunhofer IAF, Fraunhofer Institute for Applied Solid State Physics, Tullastr. 72, D-79108 Freiburg, Germany.
概括
控制伊 (Ir) 薄膜在伊特里亚稳定 (YSZ) 上的方向需要特殊的表面准备. 蚀刻预处理是防止误导域的关键,并改善磁铁喷表层中的材料质量.
科学领域:
- 材料科学 材料科学 材料科学
- 薄膜沉积的情况
- 表面科学是一门学科.
背景情况:
- (Ir) 薄膜在伊特里亚稳定 (YSZ) 上的晶圆尺度增长对于各种电子和催化应用至关重要.
- 磁铁喷射表是一种常见的技术,用于沉积高质量的薄膜.
- 了解和控制域定向对于优化片属性至关重要.
研究的目的:
- 调查在YSZ上的Ir(001) 增长期间错误定向域的形成.
- 确定减少或消除这些不良领域的策略.
- 提高晶片尺寸的伊朗电影的可复制性和质量.
主要方法:
- 在YSZ基板上的Ir(001) 的磁铁喷射表.
- 表面表征技术用于分析域结构和接口.
- 优化晶圆预处理,包括蚀刻工艺.
主要成果:
- 观察到两种类型的{111} 定向域:尖的"峡湾"形状的特征与四个旋转变量和较少定义的岛屿与八个旋转变量.
- 这些域在Ir/YSZ接口沿着不连贯的谷物边界核化,可能是由于YSZ表面缺陷.
- 在喷步骤之前和之间,过程分离和优化蚀刻预处理被确定为控制域形成的关键.
结论:
- 误导域的形成与Ir/YSZ接口和基板表面缺陷直接相关.
- 战略性的晶片蚀刻和工艺分离对于实现可重复的,高质量的面向{111}的伊朗电影至关重要.
- 这些发现为改善YSZ上Ir的晶圆尺度表提供了途径.
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