:

Jintao Wang1,2, Dingning Ke1, Feng Tian2,3

  • 1Education Center of Experiments and Innovations, Harbin Institute of Technology (Shenzhen), 518055, China.

Heliyon
|July 8, 2024
PubMed
概括

酸 (CoSi) 层有效地阻断了的扩散到中,从而消除了在10纳米技术中需要屏障层的需求. 这一发现对于先进的半导体互连至关重要.

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