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Updated: Jun 21, 2025

Atomic Layer Deposition of Vanadium Dioxide and a Temperature-dependent Optical Model
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Ab Initio 预测各种原子层沉积前体的蒸汽压力

Alexey Odinokov1, Won-Joon Son2, Alexander Yakubovich1

  • 1Samsung Advanced Institute of Technology, Samsung Electronics, 130 Samsung-ro, Suwon 16678, Korea.

Journal of chemical theory and computation
|July 11, 2024
PubMed
概括

现在可以在没有实验的情况下预测原子层沉积 (ALD) 前体的和蒸气压 (Pvap). 一种新的量子力学推导力场方法准确地估计了Pvap,有助于新型前体设计.

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