概括
半导体设备中的电场诱导第二和生成 (EFISHG) 测量通过将激光从基板侧聚焦来改进. 这种方法消除了背景干扰,以便在GaN PN二极管中进行准确的电场分析.
科学领域:
- 半导体设备的特征表征 半导体设备的特征表征
- 非线性光学是一种非线性光学.
- 光子学 是一个光子学.
背景情况:
- 电场诱导的第二和生成 (EFISHG) 提供了先进的半导体设备设计机会.
- 目前的EFISHG技术面临挑战,原因是背景第二和生成 (SHG) 和EFISHG信号之间的干扰.
- 精确的电场表征对于优化半导体性能至关重要.
研究的目的:
- 展示一种消除EFISHG测量干扰的方法.
- 为了在GaN PN二极管中实现简单的定量电场分析.
- 为了调查背景SHG和EFISHG之间的不一致性.
主要方法:
- 从化 (GaN) PN二极管的透明基板侧聚焦激光.
- 开发基于波浪生成和传播的模型.
- 将基板侧测量与PN接口接口侧测量进行比较.
主要成果:
- 通过使用基板侧照明方法,有效消除了EFISHG测量中的干扰效应.
- 定量电场分析是直接实现的,与接口侧测量不同.
- 一个拟议的模型突出了背景SHG和EFISHG光线之间的不一致性.
结论:
- 从基板侧照明是使用GaN PN二极管进行EFISHG测量的优质方法.
- 观察到的不一致性很可能是由于激光聚焦深度和相位不匹配.
- 这种技术可方便精确的电场映射,从而改善半导体设备的设计.
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