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相关概念视频

Characteristics of MOSFET01:17

Characteristics of MOSFET

362
Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
Various vital parameters influence their functionality, which is crucial for theory and electronics applications. First, channel dimensions, precisely length, and width, are pivotal. The size of these channels affects the transistor's ability to carry current and switching speeds; shorter channels typically enable...
362
MOSFET: Depletion Mode01:20

MOSFET: Depletion Mode

343
Depletion-mode MOSFETs represent a unique subset of MOSFET technology, functioning fundamentally differently from their enhancement-mode counterparts. Unlike enhancement MOSFETs, which require a positive gate-source voltage (Vgs) to turn on, depletion-mode MOSFETs are inherently conductive and "normally on" devices.
The primary characteristic of depletion-mode MOSFETs is their ability to conduct current between the drain and source terminals without gate bias. This inherent conductivity...
343
MOSFET: Enhancement Mode01:22

MOSFET: Enhancement Mode

320
Enhancement-mode MOSFETs are pivotal components in electronics, distinguished by their capacity to act as highly efficient switches. They are part of the larger family of metal-oxide Semiconductor Field-Effect Transistors (MOSFETs). They are available in two types: p-channel and n-channel, each tailored to specific polarity operations.
In their basic form, enhancement-mode MOSFETs are typically non-conductive when the gate-source voltage (Vgs) is zero. This default 'off' state means no...
320
Schottky Barrier Diode01:27

Schottky Barrier Diode

330
Schottky barrier diodes are specialized semiconductor devices characterized by their unique construction. This construction involves combining a metal layer with a moderately doped n-type semiconductor material. This combination leads to the formation of a Schottky barrier, a pivotal element that defines the diode's operational characteristics. The core functionality of Schottky barrier diodes is their capacity to allow current to flow in only one direction due to their distinctive...
330
Biasing of P-N Junction01:16

Biasing of P-N Junction

500
The operation of a p-n junction diode involves various biasing conditions, including forward bias, reverse bias, and equilibrium.
In equilibrium, no external voltage is applied across the p-n junction. The depletion region is formed at the junction interface due to the diffusion of carriers, which leaves behind charged dopants, acceptors on the p-side, and donors on the n-side. These immobile charges create an electric field that prevents further diffusion of carriers. The related energy band...
500
Diode: Reverse bias01:14

Diode: Reverse bias

675
A diode is reverse-biased when the positive terminal of an external voltage source is connected to the n-type material and the negative terminal to the p-type material. This configuration opposes the natural direction of current flow through the diode, effectively increasing the width of the depletion region and the barrier potential. The reverse bias condition produces a minimal leakage current, primarily due to minority charge carriers. This leakage becomes significant when the reverse...
675

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相关实验视频

Updated: Jun 21, 2025

Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
10:31

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在AlGaN/GaN HEMT中构建排水环绕的双门结构,以提高故障电压.

Zehui Peng1, Huangbai Liu1, Hao Yu1

  • 1School of Electronic and Computer Engineering, Peking University Shenzhen 518055 China kcchang@pkusz.edu.cn.

RSC advances
|July 16, 2024
PubMed
概括
此摘要是机器生成的。

这项研究引入了一种新的排水环绕双门 (DSDG) AlGaN/GaN高电子流动性晶体管 (HEMT) 来克服电流崩. DSDG-HEMT结构显著提高了先进功率电子的故障电压.

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Plasma-assisted Molecular Beam Epitaxy of N-polar InAlN-barrier High-electron-mobility Transistors
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科学领域:

  • 材料科学 材料科学 材料科学
  • 半导体物理 半导体物理
  • 电气工程 电气工程

背景情况:

  • AlGaN/GaN高电子移动性晶体管 (HEMT) 对于高压,高频电源应用至关重要.
  • 在高压下,HEMT中的电流崩阻碍了它们的性能和发展.

研究的目的:

  • 为了研究一个排水环绕双门 (DSDG) 的AlGaN/GaN HEMT结构,以提高分解性能.
  • 分析拟议的DSDG-HEMT的州外特征和分解机制.

主要方法:

  • 使用Sentaurus TCAD进行设备模拟和优化.
  • 研究双门结构对电子运动和能量波段的影响.
  • 分析抑制缓冲器泄漏和排水诱导的屏障降低 (DIBL) 效应.

主要成果:

  • DSDG结构有效地抑制了来自源的电子注入,减少了穿孔电流.
  • 双门通过操纵排水附近的能量带来缓解DIBL效应.
  • 模拟显示,由于抑制的缓冲器泄漏,故障电压增大约100V.

结论:

  • DSDG AlGaN/GaN HEMT 架构为增强故障电压提供了一个有希望的解决方案.
  • 这种设计有效地减轻了电流崩,为更强大的动力设备铺平了道路.
  • 这些发现有助于推进基于GaN的高性能功率电子.