对一类具有输出性能约束和异常控制的二级电磁微镜的自适应内部模型后退控制
Huasen Gan1,2, Yi Qin1, Jinfeng Zhang2
1School of Electrical Engineering and Intelligentization, Dongguan University of Technology, Dongguan 523000, China.
Micromachines
|July 27, 2024
概括
本研究介绍了电磁微镜的新控制器,尽管存在不确定性和干扰,但确保了精确的轨迹跟踪. 控制器满足性能约束,并在异常时保持控制.
科学领域:
- 控制系统工程 控制系统工程
- 机器人技术 机器人技术 机器人技术
- 机械电子学是什么意思 机械电子学
背景情况:
- 电磁微镜在各种应用中至关重要,但由于模型不确定性和外部干扰而面临挑战.
- 在输出性能限制和异常控制情况下实现精确的轨迹跟踪仍然是一个重大问题.
研究的目的:
- 为了研究二次电磁微镜模型的非对称追踪问题.
- 开发一个强大的控制器,满足输出性能约束,并在异常时保持控制.
主要方法:
- 使用输出调节框架将轨迹跟踪作为一个闭环控制问题.
- 引入了一个扩展的内部模型,将问题转换为增强系统的状态稳定.
- 设计了一个内部模型后退控制器,集成屏障莱普诺夫函数 (BLF) 和努斯姆增益.
主要成果:
- 拟议的控制器确保了电磁微镜的非对称轨迹跟踪.
- 控制器满足指定的输出性能约束.
- 即使在异常的控制情况中,控制性能也保持不变.
结论:
- 开发的内部模型后退控制器有效地解决了电磁微镜的非对称跟踪问题.
- 控制器表现出对模型不确定性和外部干扰的稳定性.
- 模拟证实了控制器在实现所需性能和处理异常方面的有效性.
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