双边扫描波面计量及其在晶体衍射波面测量中的应用
Fang Liu1, Ming Li2, Qianshun Diao2
1University of Chinese Academy of Sciences, Chinese Academy of Sciences, Beijing 100049, People's Republic of China.
Journal of synchrotron radiation
|July 29, 2024
概括
一种新的双边扫描 (DES) 技术可以对先进的同步射线辐射源进行精确的绝对晶体衍射波面测量. 这种方法确保了波面的保护,这对于在下一代光学中实现衍射有限性能至关重要.
科学领域:
- 光学和光子学 在光学和光子学.
- 材料科学 材料科学 材料科学
- 同步子辐射技术技术
背景情况:
- 第四代同步辐射源需要单色化器晶体,能够在广泛的范围内保持波面,以达到衍射有限的性能.
- 现有的方法缺乏这些先进源所需的绝对晶体衍射波面测量的精度.
- 对于新的计量技术来描述晶体光学有着极大的需求.
研究的目的:
- 开发和验证一种用于绝对晶体衍射波面测量的新技术.
- 为了能够精确地表征单色化器晶体,用于下一代同步辐射设施.
- 为晶体制造建立一个关键的反机制.
主要方法:
- 在北京同步射线辐射设施 (BSRF) 开发了一种新的边缘扫描波面计量技术.
- 实施双边跟踪方法,以提高测量精度.
- 使用开发的技术,在6毫米范围内的平坦晶体的表征.
主要成果:
- 双边扫描 (DES) 技术实现了相应的衍射表面斜率误差低于70nrad (4.57%的波面相位误差) r.m.s.
- 证明了在15nrad以下的特殊斜率误差可重复性 (<λ/100相位误差可重复性),即使是在第一代同步电源上.
- 该技术被证明是有效的测量波面误差在一个显著的晶体表面范围.
结论:
- 新的双边扫描 (DES) 技术为绝对晶体衍射波面测量提供了可行的解决方案.
- 通过DES,可以实现偏光有限水平测量,这对于先进的单色晶体的开发至关重要.
- 该技术现在是下一代同步光学制造过程中的关键反工具.
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