一个背对背的二极管模型应用于范德瓦尔斯斯科特基二极管
Jeffrey A Cloninger1, Raine Harris1, Kristine L Haley1
1Department of Physics and Astronomy, University of Nevada Las Vegas, Las Vegas, NV 89154, United States of America.
概括
2D半导体中的范德瓦尔斯接触提供较低的电阻和更高的移动性. 一个新的模型提取了Schottky屏障高度,显示了可调性在二硫化物晶体管中.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术 纳米技术
背景情况:
- 范德瓦尔斯 (vdW) 接触对优化二维半导体设备至关重要.
- 与传统方法相比,VDW接触减少了费米水平的固定,从而降低了接触电阻和更高的载体移动性.
- 这些接触物呈现出符合肖特基-莫特法则的肖特基障碍物,使得从材料性质可以进行预测.
研究的目的:
- 为分析vdW晶体管提出一个双 Schottky 屏障模型.
- 将这个模型应用于基于二硫化 (MoS2) 的屏障调节,全VDW晶体管.
- 为了证明 Schottky 屏障高度的提取及其可调性.
主要方法:
- 开发和应用一个双 Schottky 屏障模型.
- 使用石墨烯和几层石墨烯vdW接触器制造一台二硫化 (MoS2) 晶体管.
- 室温,两端电流-电压 (I-V) 测量.
- 在现场调节Schottky屏障,使用区域接触门.
主要成果:
- 双 Schottky 屏障模型成功地从 I-V 测量中提取了 Schottky 屏障高度.
- 提取的障碍高度与Schottky-Mott规则的预测保持一致.
- 通过接触门,证明了Schottky屏障高度的现场调整性.
- 验证了所有vdW晶体管的特征模型.
结论:
- 双 Schottky 屏障模型是有效的特征所有-vdW 晶体管.
- 在MoS2晶体管中的vdW接触允许提取屏障高度和现场调整.
- 这种方法简化了设备分析,并突出了VDW异构结构的潜力.
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