基于ReS2/h-BN/石墨烯异构结构的超快速多位内存
Haoyue Lu1, Yan Wang1, Xuchen Han1
1State Key Laboratory of Precision Measurement Technology and Instrument, School of Precision Instruments and Optoelectronics Engineering, Tianjin University, No. 92 Weijin Road, Tianjin 300072, China.
ACS nano
|August 1, 2024
概括
研究人员开发了一种使用ReS2 / h-BN / 石墨烯异构结构的新型浮动门内存设备. 这种先进的内存提供了超快的,多级非易失性存储,具有大内存窗口和高耐久性,显著提高了数据存储能力.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 固态电子 固态电子
背景情况:
- 数据的指数增长需要在数据存储密度和计算速度方面取得进展.
- 开发具有超快运行速度的多位内存对于满足大数据需求至关重要.
研究的目的:
- 报告一款基于ReS2/h-BN/石墨烯范德瓦尔斯异构结构的新型浮式门 (FG) 记忆装置.
- 为了研究设备的非易失性内存特性,包括操作速度,内存窗口,耐久性和保留.
- 为了探索电气和光学调节的多层存储器行为.
主要方法:
- 使用ReS2/h-BN/石墨烯范德瓦尔斯异构结构制造一个浮式门记忆装置.
- 记忆性能的表征,包括记忆窗口,删除/编程电流比,操作速度,耐久性和保留.
- 调查多层级非易失性内存状态的电气和光学调整.
主要成果:
- 该设备表现出超快 (30 ns) 和多层非挥发性内存特征.
- 实现了大内存窗口 (113.36V) 和高的擦除/编程电流比率 (10^7).
- 表现出极好的耐力 (> 1000 个周期) 和保持 (> 1100 秒).
- 展示了130级 (>7位) 的电调可调的内存状态和45级 (>5位) 的光调可调的状态.
结论:
- ReS2 / h-BN / 石墨烯异构结构是先进的浮式门存储器件的一个有希望的材料.
- 开发的设备为非易失性内存应用提供了显著的速度,存储容量和可调性改进.
- 这项工作有助于为大数据时代开发高性能内存解决方案.
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