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Updated: Jun 17, 2025

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通过光电子光谱学和初步计算,对三种典型的光酸发生器进行了全面研究
Yanrong Jiang1, Wenjin Cao2, Zhubin Hu3
1Center for Transformative Science, ShanghaiTech University, Shanghai 201210, China.
The Journal of chemical physics
|August 6, 2024
概括
该研究显示,p-toluenesulfonate (pTS-) 是193nm光刻的有前途的光酸生成器 (PAG) 离子,由于其光谱红移,电子稳定性和最佳光解特性,提高了光电阻性能.
科学领域:
- 材料科学 材料科学 材料科学
- 摄影化学的使用.
- 计算化学计算化学
背景情况:
- 光酸发生器 (PAG) 是193纳米光刻技术中的关键组件,用于先进的半导体制造.
- 了解PAG离子在分子水平上的行为对于设计高性能光电阻是必不可少的.
- 现有的PAG面临着与光谱透明度和光刻条件下的稳定性相关的挑战.
研究的目的:
- 综合评估三种原型PAG离子的分子性质:p-toluenesulfonate (pTS-),2-(trifluoromethyl) benzene-1-sulfonate (TFMBS-),和triflate (TF-). 为了全面评估三种原型PAG离子的分子性质:p-toluenesulfonate (pTS-),2-(trifluoromethyl) benzene-1-sulfonate (TFMBS-),和triflate (TF-).
- 为了研究这些离子对193nm光电阻的性能的影响.
- 阐明PAG离子结构,电子性质和石版画结果之间的关系.
主要方法:
- 综合实验光谱学 (UV-Vis吸收) 和先进的计算技术 (DFT,极化连续模型).
- 分析电子过渡,光谱吸收,垂直分离能量和气相质子亲和力.
- 评估光解反应路径和PAG分解的能量障碍.
主要成果:
- 特定的PAG离子,特别是pTS-,诱导吸收光谱的显著红移,在193nm提高透明度.
- PAG离子的电子稳定性受到溶剂效应的影响;pTS-在PGMEA中表现出最低的垂直脱离能量,防止离子损失.
- pTS-显示中度酸度 (质子亲和度为316.4 kcal/mol) 和光解反应能量 (83 kcal/mol) 在研究的离子中最低.
- 三硫p-toluenesulfonate (TPS+·pTS-) 的光解涉及由激发状态启动的同解键裂变.
结论:
- PAG离子pTS-具有中等酸度,低光解能量和适当的光谱红移的有利组合.
- 这些特征使得pTS-成为在193nm光电阻配方中开发有效的酸制剂的非常有前途的候选人.
- 该研究提供了分子层面的理解,以指导下一代石版材料的合理设计.
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