在GaN中碳和杂质缺陷:通过第一原则模拟单光子发射器
Junxiao Yuan1,2, Jinglei Du1, Yidong Hou1
1Department of Physics, Sichuan University, Chengdu 610065, China.
Materials (Basel, Switzerland)
|August 10, 2024
概括
化 (GaN) 缺陷单光子发射器显示出对高速通信的承诺. 碳兴奋剂会产生NGaVNCN缺陷,这是一个运行在864 nm的快速单光子源.
科学领域:
- 材料科学 材料科学 材料科学
- 量子光学是一种量子光学.
- 固态物理 固态物理
背景情况:
- 在化 (GaN) 中的缺陷单光子发射器 (SPE) 具有室温操作,窄线宽和高亮度的吸引力.
- 由于许多潜在的内在缺陷,GaN中SPE背后的确切机制尚未完全理解.
研究的目的:
- 系统地调查GaN.中与常见剂 (碳,) 的缺陷相互作用.
- 为了识别新的,高速缺陷的单光子源.
- 为光子应用阐明特定三元缺陷的特性.
主要方法:
- 进行了ab initio计算,以研究缺陷的形成和特性.
- 密度函数理论 (DFT) 使用佩尔杜-伯克-恩泽霍夫 (PBE) 和海德-斯库塞里亚-恩泽霍夫 (HSE) 函数.
- 对缺陷能量水平,排放波长和寿命的分析.
主要成果:
- 一个三元缺陷,NGaVNCN,被确定为一个有前途的高速单光子源.
- 这种与碳相关的缺陷具有寿命 < 1 ns 和 864 nm 的零光子线 (ZPL).
- 一个与相关的缺陷,NGaVNSiN,由于其在导电带内的能量水平,被发现不合适.
结论:
- 对GaN的碳化可以创建高效,高速的单光子发射器,适合光纤通信.
- 涉及内在空缺和剂的三元缺陷是开发先进光子设备的关键.
- 对GaN的缺陷工程进行进一步的调查有可能为高性能单光子源提供潜力.
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