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Updated: Jun 19, 2026

Preparation of Hydrophobic Metal-Organic Frameworks via Plasma Enhanced Chemical Vapor Deposition of Perfluoroalkanes for the Removal of Ammonia
12:05

Preparation of Hydrophobic Metal-Organic Frameworks via Plasma Enhanced Chemical Vapor Deposition of Perfluoroalkanes for the Removal of Ammonia

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通过NH3等离子处理对少层MoS2场效应晶体管进行调节性兴奋剂策略3

Mingu Kang1, Woonggi Hong2, Inseong Lee1

  • 1School of Electrical Engineering, Graduate School of Semiconductor Technology, Graphene/2D Materials Research Center, Center for Advanced Materials Discovery towards 3D Display, KAIST, Daehakro, Yuseong-gu, Daejeon 34141, Republic of Korea.

ACS applied materials & interfaces
|August 13, 2024
PubMed
概括

氨等离子处理使得可调节的二硫化物 (MoS) 2D 材料中的兴奋剂. 这种方法为n型兴奋剂和p型兴奋剂的替代产生硫空缺,这对于先进的电子技术至关重要.

关键词:
治疗NH3等离子体处理的NH3等离子体.金属-有机化学蒸汽沉积沉积.二硫化物是一种二硫化物.替代性胺兴奋剂是一种替代性剂.门电压控制器的门电压控制器过渡金属二甲基二甲基化物

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