在nMOS逆变器中实现极高收益和低功率,基于单层WS2晶体管在下值模式下运行
Eunyeong Yang1, Sekwon Hong1, Jiwon Ma1
1Department of Materials Science and Engineering, Yonsei University, Seoul 03722, South Korea.
ACS nano
|August 15, 2024
概括
我们开发了高收益,低功耗的n型金属氧化物半导体 (nMOS) 逆变器,使用化学蒸汽沉积 (CVD) 培养的单层二硫化物 (WS2) 场效应晶体管 (FET). 这些WS2nMOS逆变器实现了显著的收益,并展示了先进逻辑电路的潜力.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 半导体物理 半导体物理
背景情况:
- 像WS2这样的单层过渡金属二甲基化物 (TMD) 对下一代电子产品充满希望.
- 在TMD中实现高性能n型场效应晶体管 (FET) 仍然是一个挑战.
- 高质量的TMD材料的大面积合成对于实际应用至关重要.
研究的目的:
- 使用化学蒸汽沉积 (CVD) 培养的单层WS2 FETs制造和表征n型金属氧化物半导体 (nMOS) 逆变器.
- 为了研究这些WS2 nMOS逆变器的电气性能和性能.
- 探索单层WS2在低功耗,高增益逻辑电路和集成系统中的潜力.
主要方法:
- 使用化学蒸汽沉积 (CVD) 来合成大面积单层WS2膜.
- 使用AlOx/Al2O3实现了n型兴奋剂,并采用了具有高-κ HfO2介电的双门结构.
- 进行了WS2 FET和nMOS逆变器的制造和电气表征.
主要成果:
- 用CVD培养的单层WS2 FET表现出极好的电气性能,包括高开/关比和小的下值波动.
- 在子值操作的WS2 nMOS逆变器实现了异常高的内在增益 (1V时564,2V时2056) 和低功耗 (1V时∼2.3pW·μm-1).
- 演示的逻辑电路包括AND,OR,NAND,NOR门和静态随机访问存储器 (SRAM),展示了WS2的电路集成功能.
结论:
- 单层WS2 FETs,当适当合和结构化时,可以形成高收益,低功耗的nMOS逆变器.
- WS2 FET 的优越子值特性使其内在增益比传统的MOSFET 高得多.
- 这些结果突出了大面积CVD培养的单层WS2对于实用,高性能逻辑电路和集成系统的潜力.
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