接口陷对电荷噪声和低密度传输特性在Ge/SiGe异构结构中的影响
Leonardo Massai1, Bence Hetényi1, Matthias Mergenthaler1
1IBM Research Europe - Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.
概括
/-异构中的孔旋转显示出量子计算的前景. 这项研究模拟了门歇斯底里和充电噪声,揭示了材料材料.
科学领域:
- 量子计算是一种量子计算.
- 凝聚物质物理学 凝聚物质物理学
- 材料科学是一种材料科学.
背景情况:
- /- (Ge/SiGe) 异构结构中的孔旋转是有前途的量子比特平台,因为它具有快速的电控和噪声弹性.
- 这些基于SiGe的量子点阵列的可重复调整是具有挑战性的,原因是门诱导的静电障碍,漂移和歇斯底里.
研究的目的:
- 在Ge/SiGe异构结构中调查门歇斯底里斯的起源.
- 为了建模歇斯底里斯对运输指标和充电噪声的影响.
- 评估SiGe材料平台对界面陷诱导的障碍的弹性.
主要方法:
- 在Ge/SiGe异构结构上制造和表征霍尔条和量子点设备.
- 在不同积累电压下分析低密度运输指标.
- 调查短暂的低频电荷噪声组件.
主要成果:
- 开发了一种关于门歇斯底里起源及其对运输和充电噪声的影响的一致模型.
- 观察到低密度运输指标的非单调变化,与SiGe-氧化物接口充电陷的逐渐填充有关.
- 一个短暂的低频充电噪声组件被门电压推动激活,在30小时后消失.
结论:
- Ge/SiGe异构结构表现出对界面陷诱导的障碍和噪声的弹性.
- 这些发现为更大的多点量子点系统的可重复调整铺平了道路.
- 了解hysteresis机制对于推进Ge/SiGe量子位技术至关重要.
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