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Updated: Jun 17, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

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卷积神经网络辅助光电阻成型区分器,用于电子束 lithography 接触层的设计

Rongbo Zhao1, Yayi Wei2,3, Xiaolin Wang1

  • 1Institute of Nuclear and New Energy Technology, Tsinghua University, Beijing 100084, China.

The journal of physical chemistry letters
|August 19, 2024
PubMed
概括

这项研究引入了一种用于电子束光刻技术的金属氧化物纳米粒子光电阻的新型分辨器. 它准确地确定了符合关键维度统一性和接触宽度要求的配方,简化了材料选择.

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A Versatile Method of Patterning Proteins and Cells

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Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

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相关概念视频

Design Example: Resistive Touchscreen01:14

Design Example: Resistive Touchscreen

A device engineer plays a crucial role in designing user interfaces for mobile devices. One such interface is the resistive touchscreen, which fundamentally consists of two metallic layers: a flexible upper layer and a rigid lower layer, separated by a narrow gap. The high resistance between these two layers is a key characteristic of this design.
When a user touches the screen, the two layers make contact at a specific point known as the touchpoint. This contact reduces the resistance between...