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Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation01:26

Inductively Coupled Plasma Atomic Emission Spectroscopy: Instrumentation

Inductively coupled plasma (ICP) is the common plasma source used in atomic emission spectroscopy (AES), a technique that detects and analyzes various elements in a sample. This method is often called inductively coupled plasma atomic emission spectroscopy (ICP-AES).
There are three main types of inductively coupled plasma atomic emission spectroscopy  (ICP-AES) instruments: sequential, simultaneous multichannel, and Fourier transform instruments, with the latter being less commonly used.

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基于自动分化的波长多复合多模式EUV反射图形.

Yifeng Shao1,2, Sven Weerdenburg3, Jacob Seifert4

  • 1Imaging Physics Department, Applied Science Faculty, Delft University of Technology, Lorentzweg 1, Delft, 2628 CJ, The Netherlands. Y.Shao@tudelft.nl.

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概括
此摘要是机器生成的。

图解极紫外线 (EUV) 成像为半导体提供纳米尺度计量技术. 一个新的波长复合算法提高了吞吐量和准确性,即使在不稳定的EUV源.

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科学领域:

  • 材料科学与工程 材料科学与工程
  • 光学物理学 光学物理学
  • 纳米技术纳米技术

背景情况:

  • 图解极紫外线 (EUV) 衍射成像是半导体行业纳米尺度计量技术的关键技术.
  • 高生成 (HHG) EUV源和计算方法的进步增加了对该技术的兴趣.
  • 目前的方法面临源不稳定性和计算复杂性的挑战.

研究的目的:

  • 引入和测试用于图形 EUV 成像的新型波长复合重建算法.
  • 为了提高测量吞吐量和数据多样性,以实现精确的纳米样本表征.
  • 解决和减轻高生成EUV源中固有的不稳定性.

主要方法:

  • 开发一个波长多重复的重建算法.
  • 实施一种模态方法,使用相互不连贯的空间模式来表示照明.
  • 使用具有自动差异化和GPU加速的机器学习平台进行复杂的计算.

主要成果:

  • 该算法成功地适应了实验的不确定性,并实现了接近衍射极限的分辨率.
  • 证明了对20纳米图案金结构的晶圆样本的准确重建.
  • 优化超过2亿个参数使得处理复杂的物理相互关系成为可能.

结论:

  • 这种新的算法显著提高了EUV ptychography中的测量吞吐量和数据多样性.
  • 模式方法有效地解决了高温气体源的不稳定性.
  • 通过这种算法增强的图形学已被确立为半导体应用的高效和准确的计量工具.