相关实验视频

Updated: May 12, 2026

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
07:47

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Published on: February 12, 2017

7.2K

使用低分子质量电阻 (<500大) 在石版画中接近安格斯特罗姆尺度分辨率.

Mohammad S M Saifullah1,2, Anil Kumar Rajak1, Kevin A Hofhuis1

  • 1Paul Scherrer Institut, Forschungsstrasse 111, Villigen PSI 5232, Switzerland.

ACS nano
|August 20, 2024
PubMed
概括

新的含金属电阻可以实现安格斯特罗姆尺度的图案,具有高分辨率和低粗度. 这一在电阻化学方面的突破克服了传统的权衡,使先进的半导体制造成为可能.

关键词:
电子束 lithography 电子束 lithography 电子束 lithography 电子束 lithography 电子束 lithography 电子束极端紫外线的光刻法极端紫外线的光刻法.低分子质量的电阻可以抵抗.金属氧化物质的金属.纳米制造的纳米制造激进的启动者激进的启动者

更多相关视频

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies09:45

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

Published on: June 12, 2018

9.6K
Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

10.1K

相关概念视频

Super-resolution Fluorescence Microscopy01:37

Super-resolution Fluorescence Microscopy

Super-resolution fluorescence microscopy (SRFM) provides a better resolution than conventional fluorescence microscopy by reducing the point spread function (PSF). PSF is the light intensity distribution from a point that causes it to appear blurred. Due to PSF, each fluorescing point appears bigger than its actual size, and it is the PSF interference of nearby fluorophores that causes the blurred image. Various approaches to achieving higher resolution through SRFM have recently been developed.