在MoS2中的马辐射诱导的电气特征变化,场效应晶体管与埋藏的局部后门结构
Su Jin Kim1, Seungkwon Hwang2, Jung-Dae Kwon2
1Korea Atomic Energy Research Institute, 29 Geumgu-gil, Jeongeup 56212, Republic of Korea.
Nanomaterials (Basel, Switzerland)
|August 28, 2024
概括
玛辐射显著影响二硫化物 (MoS) 场效应晶体管,导致减少电流和正值值电压变化. 这些变化与Al2O3介电层的接口效应有关.
科学领域:
- 材料科学 材料科学 材料科学
- 半导体物理 半导体物理
- 辐射的影响 辐射效应
背景情况:
- 二维 (2D) 半导体技术,特别是使用二硫化 (MoS),在辐射敏感环境中面临着挑战.
- 了解辐射效应对于在涉及电离辐射的应用中部署基于MoS的设备至关重要.
研究的目的:
- 研究玛辐射对埋藏局部后门结构的MoS2场效应晶体管 (FET) 的电气性能的影响.
- 分析辐射对Al2O3门介电和MoS2/Al2O3接口的影响.
主要方法:
- 在玛辐射之前和之后的MoS2 FETs的电特性.
- 分析传输和输出特征,以量化设备性能变化.
- 在不同辐射剂量 (1,2,3kGy) 下对介电和接口特性进行研究.
主要成果:
- 在暴露3kGy时,当前水平下降15.7%,观察到3kGy.
- 测量了值电压的正变化:0.50 V (1 kGy),0.99 V (2 kGy) 和1.15 V (3 kGy).
- 观察到的电变异归因于Al2O3介电和电子在MoS2/Al2O3接口上的陷.
结论:
- 马辐射降低了MoS2FETs的性能.
- 接口工程和介电性质在基于MoS的设备的辐射硬度中发挥着关键作用.
- 这些发现提供了关于二维半导体在辐射环境中的可靠性的见解.
相关概念视频
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Metal-oxide-semiconductor field-effect Transistors, or MOSFETs, play a critical role in electronic circuits. They are primarily utilized for amplifying and switching signals.
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