在温度循环下,在介质中TSV结构的可靠性模拟分析
Wenchao Tian1,2, Haojie Dang1, Dexin Li1
1School of Electro-Mechanical Engineering, Xidian University, Xi'an 710000, China.
Micromachines
|August 29, 2024
概括
先进的半导体包装面临着可靠性挑战. 本研究分析了Through Silicon Via (TSV) 热力学应力,发现了关键点并估计了3.17 × 10^5周期寿命,缺陷可能会提高可靠性.
科学领域:
- 材料科学 材料科学 材料科学
- 机械工程 机械工程
- 电气工程 电气工程
背景情况:
- 半导体集成需要更小的芯片尺寸和先进的包装,如通过 (TSV) 技术.
- 增加TSV面积比和缩小直径引发了热力学可靠性问题,特别是由于材料不匹配而导致的插座基板.
- 在TSV铜柱的电缺陷是常见的,可以影响可靠性.
研究的目的:
- 为了进行TSV结构在复杂的插座基板内的热力学分析.
- 在可变温度条件下 (-55°C至85°C) 调查TSV的热应力行为和可靠性.
- 评估电缺陷对TSV可靠性的影响.
主要方法:
- 开发了一个整体的有限元模型来识别关键的TSV位置.
- 采用子模型分析来检查最关键的TSV中的应力和变形.
- 根据应力和变形分析计算了温度周期寿命.
主要成果:
- 中央TSV被确定为最关键的,表现出最高的等效应力.
- 最大变形显示周期性变化,而最大等效应力在周期内积累,在TSV/RDL接口达到顶峰.
- 临界点的估计温度周期寿命为3.1708 × 10^5个周期.
- 电缺陷"b"在温度循环过程中减轻了TSV中的热应力.
结论:
- 在TSV中的热力学应力对于高级半导体包装可靠性至关重要.
- 缺陷的位置和存在显著影响TSV性能和寿命.
- 这些发现对于优化高可靠性半导体组件的设计和制造至关重要.
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