在极端紫外线暴露下,甲基乙标记的树突性六醇的可溶性变化行为
Hyun-Taek Oh1, Gayoung Kim2, Seok-Heon Jung1
1Department of Polymer Science and Engineering, Inha University, Incheon 22212, Republic of Korea.
ACS omega
|September 9, 2024
概括
研究人员开发了DHP-L6,这是一种用于极紫外线 (EUV) 光刻的新型单元分子电阻. 这种材料利用碳-键分解进行高分辨率负色调成像,进步半导体图案技术.
科学领域:
- 材料科学 材料科学 材料科学
- 纳米技术纳米技术
- 有机化学 有机化学
背景情况:
- 极端紫外线 (EUV) 石版对于先进的半导体制造至关重要.
- 开发新的分子电阻对于在EUV光刻中实现更高的分辨率和效率至关重要.
- 现有的抵抗通常面临着敏感性,分辨率和流程集成方面的挑战.
研究的目的:
- 发现和描述用于EUV光刻的单元分子电阻.
- 研究电离辐射诱导电阻中碳-键分解的机制.
- 为了展示开发的电阻的高分辨率图案设计能力.
主要方法:
- 通过将 perfluoroalkyl 以太部分与树突性六醇 (DHP) 结合,合成 DHP-L6.
- DHP-L6薄膜暴露于EUV和电子束辐射.
- 在化开发介质中进行溶解性测试.
- 使用富里埃变换红外光谱学 (FT-IR) 和X射线光电子光谱学阐明化学机制.
- 纳米印记实验用于材料属性分析.
- 高分辨率的 lithographic 图案设计. 高分辨率的光刻图案.
主要成果:
- DHP-L6在暴露于EUV/电子束时显示溶解度下降,使得负色调成像成为可能.
- 在DHP-L6中,C-F键的电子诱导分解被确定为关键机制,导致分子网络的形成.
- 成功创建了26纳米的模板图案,在110mJ cm-2.2的EUV辐射下成功创建了26纳米的模板图案.
- 证实单元醇基化合物可以在电离辐射下作为图案材料.
结论:
- DHP-L6代表了一种有前途的单元分子电阻,用于EUV光刻.
- 该研究阐明了涉及C-F键和基因重组的分解机制.
- 需要进一步优化,以降低曝光能量,并改善实际应用的线边粗度.
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