高性能p型准欧姆式WSe2晶体管使用添加WSe2作为中间层的接触层
Xuan Phu Le1,2, Annadurai Venkatesan3, Debottam Daw1,2
1Department of Energy Science, Sungkyunkwan University, Suwon 16419, Republic of Korea.
ACS applied materials & interfaces
|September 17, 2024
概括
研究人员开发了一种新的2D/2D接触方法,使用添加的二化 (V-WSe2) 来显著降低2D过渡金属二原化 (TMDC) 晶体管中的Schottky屏障高度,提高设备性能.
科学领域:
- 材料科学 材料科学 材料科学
- 凝聚物质物理学 凝聚物质物理学
- 纳米技术纳米技术
背景情况:
- 像二化 (WSe2) 这样的二维 (2D) 过渡金属二化 (TMDC) 对先进电子有前途.
- 在金属半导体 (MS) 接口上的高SBH阻碍了基于TMDC的设备的性能.
研究的目的:
- 引入一种新的2D/2D接触策略,以尽量减少TMDC设备中的接触电阻和SBH.
- 证明添加WSe2 (V-WSe2) 作为接触材料的有效性,用于改进电子和光电子应用.
主要方法:
- 使用V-WSe2作为WSe2通道上的源和排水接口的晶体管的制造.
- 晶体管性能的表征,包括开/关电流比,移动性,接触电阻和SBH.
- 使用V-WSe2和Cr不对称接触器构建一个Schottky光二极管.
主要成果:
- 与V-WSe2接触的晶体管表现出稳定的p型准欧姆行为,具有异常高的开/关电流比率 (>10^8在室温下,10^11在10K).
- 实现了优秀的设备指标:电流为68.87μA,可移动性为103.80cm^2V^-1s^-1,接触电阻为0.92kΩ,以及非常低的SBH为1.51meV的孔.
- 肖特基光二极管的响应率为116mA W^-1.
结论:
- 使用V-WSe2的2D/2D接触方法有效地减少了接触电阻和SBH,显著提高了TMDC晶体管的性能.
- 这种方法为开发基于TMDC的高性能电子和光电子设备提供了简单有效的途径.
- 该研究突出了为下一代半导体应用量身定制的2D材料兴奋剂的潜力.
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